University of Delaware / Dupont Hall / Ioffe Institute / Temperaturedependent Hall / American Institute of Physics / University of California / /
IndustryTerm
carrier concentration / Metal deposition using electron beam evaporation / plasma-enhanced chemical-vapor deposition / higher energy electrons / low-energy electrons / spherical constant energy surfaces / carrier concentration increases / chemical potential profile / low-energy electron scattering / spatial chemical potential profile / average carrier energy / carrier density / alloy systems / energy efficiency metric / chemical potentials / thermoelectric device / energy / optical phonon energy / metal lift-off / thermoelectric energy efficiency metric / energy conserving / material systems / energy dependence / nm metal stack / iterative solution / vs carrier concentration / chemical potential profiles / /
MusicGroup
STRUCTURE / /
OperatingSystem
Fermi / /
Organization
Cambridge University / University of California / American Institute of Physics / Department of Materials / U.S. Securities and Exchange Commission / office of Naval Research Thermionic Energy Conversion Center MURI / University of Delaware / Department of Electrical and Computer Engineering / Department of Electrical / Ioffe Institute / /
Person
Z. X. Bian / Z. Bian / G. Zeng / S. L. Singer / Ashok T. Ramu / J. E. Bowers / Laura E. Cassels / A. Shakouri / D. Vashaee / T. Favaloro / M. Zebarjadi / A. C. Gossard / C. G. Van de Walle / A. Mazumdar / Mihal Gross / / /
Position
D. J. / Professor / Professor U. K. Mishra / Professor / Singer / Professor U. K. Mishra / /
JOURNAL OF APPLIED PHYSICS 107, 083707 共2010兲 Rigorous calculation of the Seebeck coefficient and mobility of thermoelectric materials Ashok T. Ramu,1,a兲 Laura E. Cassels,2 Nathan H. Hackman,1 Hong Lu,3 Joshua M.