University of Delaware / Dupont Hall / Ioffe Institute / Temperaturedependent Hall / American Institute of Physics / University of California / /
IndustryTerm
carrier concentration / Metal deposition using electron beam evaporation / plasma-enhanced chemical-vapor deposition / higher energy electrons / low-energy electrons / spherical constant energy surfaces / carrier concentration increases / chemical potential profile / low-energy electron scattering / spatial chemical potential profile / average carrier energy / carrier density / alloy systems / energy efficiency metric / chemical potentials / thermoelectric device / energy / optical phonon energy / metal lift-off / thermoelectric energy efficiency metric / energy conserving / material systems / energy dependence / nm metal stack / iterative solution / vs carrier concentration / chemical potential profiles / /
MusicGroup
STRUCTURE / /
OperatingSystem
Fermi / /
Organization
Cambridge University / University of California / American Institute of Physics / Department of Materials / U.S. Securities and Exchange Commission / office of Naval Research Thermionic Energy Conversion Center MURI / University of Delaware / Department of Electrical and Computer Engineering / Department of Electrical / Ioffe Institute / /
Person
Z. X. Bian / Z. Bian / G. Zeng / S. L. Singer / Ashok T. Ramu / J. E. Bowers / Laura E. Cassels / A. Shakouri / D. Vashaee / T. Favaloro / M. Zebarjadi / A. C. Gossard / C. G. Van de Walle / A. Mazumdar / Mihal Gross / / /
Position
D. J. / Professor / Professor U. K. Mishra / Professor / Singer / Professor U. K. Mishra / /