A. Atwater Thomas J. Watson Laboratories / Academic Press Inc. / maximal Ag / L. A. Sweatlock S. A. / Mead / anomalous Ag / A. Polman Thomas J. Watson Laboratories / 12 nm Ag / /
Country
Netherlands / United States / /
Currency
USD / / /
Facility
Institute AMOLF / California Institute of Technology / D. G. Hall / /
IndustryTerm
metal interface / energy density decays / low-energy asymptotic behavior / conventional planar insulator-metal-insulator / field-sensitive applications / higher energy density values / energy density values / lower energy peak / metal dielectric function / energy density / near-constant core energy density / insulator-metal-insulator / metal surface / electromagnetic energy density profiles / energy density decay / finite energy bandwidth / energy / metal-dielectric interface / metal / telecommunications frequencies / metal film / electromagnetic energy / silicon-on-insulator networks / contributed energy density profiles / energy density contributions / plane-wave solutions / energy densities / metal/dielectric interface / higher energy / large energy density decay lengths / dispersion solutions / /
MarketIndex
nm兲 achieving effective / /
Organization
California Institute of Technology / Department of Defense Army Research office / National Science Foundation / Center for Nanophotonics / Air Force office of Scientific Research / /
Person
R. Van Duyne / Henri Lezec / R. Van Duyna / Nat / Domenico Pacifici / A. Haes / R. Zia / Raman spectroscopy / /
PHYSICAL REVIEW B 73, 035407 共2006兲 Plasmon slot waveguides: Towards chip-scale propagation with subwavelength-scale localization J. A. Dionne,* L. A. Sweatlock, and H. A. Atwater Thomas J. Watson Laboratories of Ap