SISPAD 2012, September 5-7, 2012, Denver, CO, USA Modeling Source Drain Contact Resistance in Nanoscale MOSFETs E. Chen*, Anson C-C Wang, H.S. Chen, W.H. Hsieh, T-H Yu, T.M. Shen, Jeff Wu, and C.H. Diaz TCAD Division, T - Resistance - Document - PDFSEARCH.IO

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Date: 2013-02-12 08:39:10		SISPAD 2012, September 5-7, 2012, Denver, CO, USA Modeling Source/Drain Contact Resistance in Nanoscale MOSFETs E. Chen*, Anson C-C Wang, H.S. Chen, W.H. Hsieh, T-H Yu, T.M. Shen, Jeff Wu, and C.H. Diaz TCAD Division, T Add to Reading List Source URL: in4.iue.tuwien.ac.at Download Document from Source Website File Size: 187,47 KB Share Document on Facebook