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ALLRESIST Conductive top layer for e-beam lithographie for all e-beam resists (Electra 92) M. Schirmer a, U. Barth b, G. Schmidt c, C. Kaiser a, M. Hentschel d Allresist GmbH, Strausberg, Germany
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Document Date: 2016-10-12 09:04:14
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ALLRESIST Conductive top layer for e-beam lithographie for all e-beam resists (Electra 92) M. Schirmer a, U. Barth b, G. Schmidt c, C. Kaiser a, M. Hentschel d Allresist GmbH, Strausberg, Germany