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Extreme ultraviolet lithography / Photomask / Ultraviolet / Reflectivity / Extreme ultraviolet / 100 nanometres / Refractive index / Color / Electromagnetic radiation / Physics / Optics


Mask aspects of EUVL imaging at 27nm node and below Natalia Davydovaa,*, Eelco van Settena, Sang-In Hand, Mark van de Kerkhof , Robert de Kruifa, Dorothe Oorschota, John Zimmermane, Ad Lammersa, Brid
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Document Date: 2013-04-19 19:56:51

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City

Leuven / Albany / Santa Clara / Dresden / Wilton / /

Company

KLA-Tencor / EUV High Volume Manufacturing / Shin-Etsu / Toppan Photomasks INC / Brion Technologies Incorporated / Netherlands B.V. / /

Country

Belgium / United States / Netherlands / /

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IndustryTerm

nm imaging / acceptable imaging performance / lithography tool / imaging / software solution / /

MusicGroup

ML / /

Person

Noreen Harnede Jiong Jiangc / Natalia Davydovaa / Robert de Kruifa / Anton van Oostena / Wei Liuc / John Zimmermane / Frank E. Abboud / Frank Driessena / Mark van de Kerkhof / Wilhelm Maurer / Mircea Dusab / /

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ProgrammingLanguage

ML / /

ProvinceOrState

New York / California / Connecticut / /

Technology

Alpha / broadband / spectroscopy / lithography / simulation / natalia.davydova@asml.com Photomask Technology / /

URL

http /

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