ASML / Troitsk / Dublin / Moscow / Tokyo / Kyoto / Berlin / Prague / /
Company
HVM Insertion (S3) Mark Phillips Intel Corporation / Nikon / Takashi Saitou2 1 Gigaphoton Inc. / RnD-ISAN/EUV Labs / IR Radiation (S31) V. V. Medvedev1 A. E. / Czech Republic Research Review / Chiyoda / EUV Litho Inc. / JAPAN 2 Gigaphoton Inc. / USA 2 Integrated Optical Systems / optiX fab GmbH / /
Country
Germany / Netherlands / Japan / Russia / United States / Ireland / Czech Republic / /
Facility
Institute of Physics AS / Utsunomiya University / National Institute of Standards and Technology / Sophia University / University of Twente / Nikolay Nikolaevich Salashchenko Institute / Oyama facility / Keldysh Institute of Applied Mathematics RAS / Osaka University / N. N. Salashchenko Institute / TBA Lecture Hall / University College Dublin / Burlington Hotel / MESA+ Institute / UCD Campus / Nagaoka University of Technology / Czech Technical University / Institute of Laser Engineering / Kansai Photon Science Institute / Hiratsuka facility / /
Holiday
Battle of the Boyne / /
Organization
MESA+ Institute for Nanotechnology / Czech Technical University in Prague / Institute of Laser Engineering / Sophia University / Nikolay Nikolaevich Salashchenko Institute for Physics of Microstructures / Utsunomiya University / School of Physics / National Institute for Fusion Science / N. I. Chkhalo and N. N. Salashchenko Institute / Akira Sasaki Quantum Beam Science Directorate / Nagaoka University of Technology / Kansai Photon Science Institute / Osaka University / Keldysh Institute of Applied Mathematics RAS / Japan Modeling of the Laser Plasma Interaction for the Development of Efficient EUV Sources / National Institute of Standards and Technology / Fergal O’Reilly / Paddy Hayden / and Gerry O’Sullivan School of Physics / University of Twente / Institute of Physics AS / Institute for Spectroscopy RAS / Center for Optical Research & Education / University College Dublin / Optical Technology Innovation Center / Department of Advanced Interdisciplinary Sciences / Japan Atomic Energy Agency / Institute for Laser Technology / Department of Electrical Engineering / /
Person
Katsuhiko Murakami / Vadim Banine / Yuriy Platonov / Chris Mack Monday / Hakaru Mizoguchi / Bowen Li / Ray Sources / George Moore / Thomas Cummins / Padraig Dunne / Joe Carthy / Emma Sokell / Vivek Bakshi / /
Position
Speaker / Collector Development / Session Chair / /
2008 International Workshop on EUV Lithography