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Fluorocarbon-Based Passivation in STI Plasma Etching A.P. Milenina, R. Athimulama, M. Demanda, and B. Coenegrachtsb b Lam © IMECCONFIDENTIAL
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Document Date: 2012-05-24 09:11:51
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File Size: 755,60 KB
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City
Fluorocarbon /
/
Company
Belgium Research Corp. /
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Person
J. Hoang J. Vac /
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ProvinceOrState
Arkansas /
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Technology
SRAM /
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SocialTag
Microtechnology
Semiconductor device fabrication
IMEC
Leuven
45 nanometer
65 nanometer
Etching
OK
Confidential
Materials science