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Chemistry / Intermolecular forces / Atomic force microscopy / Park Systems / Microscopy / Image scanner / Vibrational analysis with scanning probe microscopy / NanoWorld / Science / Scientific method / Scanning probe microscopy


Critical Dimensions Measurement of High Aspect Ratio Trench with XE AFM >>> Figure 1. (a) XE Scan System separates the Z-scanner from
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Document Date: 2011-11-12 18:00:00

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File Size: 1,36 MB

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City

Suwon / Santa Clara / /

Company

Park Systems Inc. / Park Systems Corp. / Park Systems Japan Inc. / /

Country

Korea / /

Facility

Park Systems Japan Inc. Nakamaya Bldg. / /

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IndustryTerm

ultimate solution / Sufficient bottom travel / imaging / semiconductor metrology tool / /

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ProvinceOrState

California / /

Technology

semiconductor / AFM technology / /

URL

www.parkafm.com / www.parkafm.co.kr / www.parkafm.co.jp / /

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