University of New South Wales / Institute of Materials Physics / Versatile Building / University of Waikato / Karlsruher Institute of Technology / /
IndustryTerm
high energy mechanical milling / biomedical applications / low power consumption heterostructure devices / thin noble metal films / charge carrier density / metal/insulator transition / model systems / energy applications / charge carrier scattering / chemical bonding / chemical methods / narrow gap systems / /
Organization
Faculty of Science / Electron Microscopy Unit / School of Engineering / Austrian Science Fund / Graz Univ. of Technology / Department of Physics / Mansoura Univ. / University of New South Wales / Sydney / University of Waikato / ETSF / Ecole Polytechnique / Institute of Technology / Paul Munroe2 Waikato Centre for Advanced Materials / Institute of Materials Physics / University of Messina Attached Abstract Duplicate / /
Person
U. Wolff Tu / C. Pernechele W.J. Botta / M. Chen C.Y. Poster-Mo / Hai-Jun Jin / S. Van Petegem Presented / J. Qin Fr / R. Paul Fr / S. Van Petegem / M. Golshan Th / C. Pernechele / Oliveira M. Chvoj / B. Nasr Th / Hassan Mo / L. Simon Th / Conor Hogan / A. Calandra P. Park / Millan A. Fr / Y. Ein-Eli Tu / H. Van Swygenhoven / Martinez-Criado Tu / Julián Fernández Mo / B. Ryu Fr / K. Mitra M. J. Jafari / S. Aly-Hassan Fr / Rita Magri / R. Larciprete / A. Millán Upgraded / Marco Th / P. Ayyub Th / Rodolfo Del Sole / Paola L. Kvitek Moved / R. Palmer Tu / C. Gimenez-Lopez Tu / M. Albrecht Th / Santo Th / K. Abdel Halim / X. Huang Tu / Shakir M. Paalo / /
Th-pm-B-C5 A. Persano Presented / Moved / Replaces S. Ghaffari / S. Bagiante / Poster / Poster Withdrawn Poster Withdrawn Moved / C. Meneghini / T10 / F-C6 / Replaces Y. Hirooka / F-C2 P. / P. Sahoo / V. Müller / Poster Withdrawn Late submission Poster / We-am-E-C7 D. Akten / F-C4 M. / Replaces M. Celino / Brought / Y. Liu A. Telegin / F-C3 S. / G. Renaud / V. Iannotti / C. Danilenko L. Kvitek S. Lizzit C. Hogan Upgraded / R. Milazzo / F-I1 T. / S.A. Khan / F-C6 Late / F-C1 L. / Revised Presenting Auth / C6 / /