<--- Back to Details
First PageDocument Content
Semiconductor fabrication plant / Rochester Institute of Technology / Applied Materials / Semiconductor Equipment and Materials International / Semiconductor industry / Microtechnology / Advanced Technology Development Facility / College of Nanoscale Science and Engineering / Semiconductor device fabrication / SEMATECH / Technology
Date: 2012-11-07 08:09:59
Semiconductor fabrication plant
Rochester Institute of Technology
Applied Materials
Semiconductor Equipment and Materials International
Semiconductor industry
Microtechnology
Advanced Technology Development Facility
College of Nanoscale Science and Engineering
Semiconductor device fabrication
SEMATECH
Technology

SEMATECH[removed]A Final Report to the Department of Defense February 21, 1997 Executive Summary

Add to Reading List

Source URL: www.dod.gov

Download Document from Source Website

File Size: 506,13 KB

Share Document on Facebook

Similar Documents

Partial Aborts for Transactions via First-Class Continuations Matthew Le Matthew Fluet  Rochester Institute of Technology, USA

Partial Aborts for Transactions via First-Class Continuations Matthew Le Matthew Fluet Rochester Institute of Technology, USA

DocID: 1xUJo - View Document

Answer-Type Prediction for Visual Question Answering Kushal Kafle and Christopher Kanan∗ Chester F. Carlson Center for Imaging Science Rochester Institute of Technology {kk6055, kanan}@rit.edu

Answer-Type Prediction for Visual Question Answering Kushal Kafle and Christopher Kanan∗ Chester F. Carlson Center for Imaging Science Rochester Institute of Technology {kk6055, kanan}@rit.edu

DocID: 1vbT7 - View Document

Captions Versus Transcripts for Online Video Content Raja S. Kushalnagar, Walter S. Lasecki† , Jeffrey P. Bigham† Rochester Institute of Technology 96 Lomb Memorial Dr. Rochester, NYUSA

Captions Versus Transcripts for Online Video Content Raja S. Kushalnagar, Walter S. Lasecki† , Jeffrey P. Bigham† Rochester Institute of Technology 96 Lomb Memorial Dr. Rochester, NYUSA

DocID: 1vbNT - View Document

Is Lines of Code a Good Measure of Effort in Effort-Aware Models? Emad Shihab∗ , Yasutaka Kamei+ , Bram Adams# and Ahmed E. Hassan@ Department of Software Engineering∗ , Rochester Institute of Technology, Rochester,

Is Lines of Code a Good Measure of Effort in Effort-Aware Models? Emad Shihab∗ , Yasutaka Kamei+ , Bram Adams# and Ahmed E. Hassan@ Department of Software Engineering∗ , Rochester Institute of Technology, Rochester,

DocID: 1uYvY - View Document

Inventory and transport of plastic debris in the Laurentian Great Lakes Matthew J. Hoffmana,1 , Eric Hittingerb a School  of Mathematical Sciences, Rochester Institute of Technology, 85 Lomb Memorial

Inventory and transport of plastic debris in the Laurentian Great Lakes Matthew J. Hoffmana,1 , Eric Hittingerb a School of Mathematical Sciences, Rochester Institute of Technology, 85 Lomb Memorial

DocID: 1uTvD - View Document