SISPAD 2012, September 5-7, 2012, Denver, CO, USA Accurate Simulation of Doping-Dependent Silicide Contact Resistance Using Nano-contact Test Structure for 22nm-node and Beyond Seong-Dong Kim a, Emre Alptekin a , Sameer

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Date: 2013-02-12 08:39:11		SISPAD 2012, September 5-7, 2012, Denver, CO, USA Accurate Simulation of Doping-Dependent Silicide Contact Resistance Using Nano-contact Test Structure for 22nm-node and Beyond Seong-Dong Kim a, Emre Alptekin a , Sameer Add to Reading List Source URL: in4.iue.tuwien.ac.at Download Document from Source Website File Size: 264,59 KB Share Document on Facebook