![Electronics / Technology / Nanoelectronics / Electromagnetism / Nanowire / Microtechnology / Nanoimprint lithography / Integrated circuit / Nanotechnology / Nanolithography / Overlay / Photolithography Electronics / Technology / Nanoelectronics / Electromagnetism / Nanowire / Microtechnology / Nanoimprint lithography / Integrated circuit / Nanotechnology / Nanolithography / Overlay / Photolithography](https://www.pdfsearch.io/img/9a6ce27a85ccd3bd6d4e307a47a957d1.jpg) Date: 2011-03-16 01:19:58Electronics Technology Nanoelectronics Electromagnetism Nanowire Microtechnology Nanoimprint lithography Integrated circuit Nanotechnology Nanolithography Overlay Photolithography | | 3-D Integration Requirements for Hybrid Nanoscale-CMOS Fabrics Pavan Panchapakeshan1, Priyamvada Vijayakumar1, Pritish Narayanan1, Chi On Chui2, Israel Koren1 and C.Andras Moritz1 1Add to Reading ListSource URL: euler.ecs.umass.eduDownload Document from Source Website File Size: 701,54 KBShare Document on Facebook
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