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Spintronics / Leptons / Semiconductor device fabrication / Positronium / Electron / Positron / Ion implantation / Silicon on insulator / Annihilation radiation / Physics / Quantum electrodynamics / Particle physics


JOURNAL OF APPLIED PHYSICS VOLUME 91, NUMBERMAY 2002
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Document Date: 2003-02-11 04:16:54

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City

Berlin / /

Company

Canon Inc. / Japan Atsushi Ogura Silicon Systems Research Laboratories / Shin-Etsu Chemical Co. / IBIS Technology Co. / Ge / NEC Corporation / /

Country

Taiwan / Japan / /

Currency

USD / /

Facility

American Institute of Physics Downloaded / University of Tsukuba / Institute of Applied Physics / American Institute of Physics / Tomohisa Mikado National Institute of Advanced Industrial Science / Wuhan University / /

IndustryTerm

incident energy / energy range / incident positron energy / chemical etching / implantation energy / energy distribution / energy / /

Movie

S SiO2 / /

NaturalFeature

Fujiyama / /

Organization

American Institute of Physics / University of Tsukuba / Institute of Applied Physics / Tomohisa Mikado National Institute of Advanced Industrial Science and Technology / Department of Physics / Wuhan University / Wuhan / /

Person

M. Fujinami / Toshiyuki Ohdaira / H. Schut / F. A. Alkemade / Akira Uedono / K. Westerduin / Ryoichi Suzuki / A. van Veen / P. E. Mijnarends / Zhi Quan Chena / /

Product

BESOI2 / Wafers BESOI1 / /

Technology

semiconductor / radiation / semiconductors / /

URL

http /

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