![Atomic layer deposition / Semiconductor / Hafnium(IV) silicate / Chemistry / Electromagnetism / Physics / Electronic engineering / High-k dielectric / Transistors Atomic layer deposition / Semiconductor / Hafnium(IV) silicate / Chemistry / Electromagnetism / Physics / Electronic engineering / High-k dielectric / Transistors](https://www.pdfsearch.io/img/1858b0ad8c92baf982991bdaa4bc5e6b.jpg)
| Document Date: 2010-12-27 22:22:07 Open Document File Size: 72,08 KBShare Result on Facebook
City Tokyo / Si / / Company RBS / / Country Japan / / Currency pence / / / Facility The University of Tokyo / / IndustryTerm metal oxide semiconductor / chemical states / higher binding energy corresponding / / MusicGroup Surface / Interface / Valence / Chemistry / / Organization University of Tokyo / Tokyo / Japan Science and Technology Agency / Synchrotron Radiation Research Organization / Department of Applied Chemistry / / Technology semiconductor / Radiation / spectroscopy / x-ray / dielectric / /
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