Journal of Photochemistry and Photobiology A: Chemistry–154 Nanopatterning with conformable phase masks Joana Maria a , Seokwoo Jeon a , John A. Rogers a,b,∗ a

First Page		Document Content
Date: 2004-09-07 14:36:00 Chemistry Materials science Electromagnetic radiation Microtechnology Photolithography Nanolithography Photoresist Electron-beam lithography Mask Ultraviolet Resist Atomic-force microscopy		Journal of Photochemistry and Photobiology A: Chemistry–154 Nanopatterning with conformable phase masks Joana Maria a , Seokwoo Jeon a , John A. Rogers a,b,∗ a Add to Reading List Source URL: rogers.matse.illinois.edu Download Document from Source Website File Size: 321,13 KB Share Document on Facebook

	FEATURE ARTICLE www.rsc.org/chemcomm \| ChemComm Cheating the diﬀraction limit: electrodeposited nanowires patterned by photolithography DocID: 1rw16 - View Document
	2013 a nn ua l rep o r t a nd 2014 prox y chairm an ’ s le t t er 2014 DocID: 1rsw9 - View Document
	Electronic Devices on Various Substrates: Fabrication of Releasable SingleCrystal SiliconMetal Oxide FieldEffect Devices and Their Deterministic Assembly on Foreign Substrates (Adv. Funct. Mater) DocID: 1rrrV - View Document
	creative engineering and manufacturing UV-LED photolithography exposure system idonus proposes an innovative UV illumination system based on the use of high power LEDs and highgrade Swiss microlens arrays. This product DocID: 1re6A - View Document
	Article pubs.acs.org/cm Thin Film Receiver Materials for Deterministic Assembly by Transfer Printing Tae-il Kim,*,† Mo Joon Kim,‡ Yei Hwan Jung,§ Hyejin Jang,† Canan Dagdeviren,∥ Hsuan An Pao,∥ DocID: 1r467 - View Document