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Self-organization / Supramolecular chemistry / Underpotential deposition / Thiol / Electron beam lithography / Chemistry / Nanotechnology / Self-assembled monolayer


Nanoscale patterning of a self-assembled monolayer by modification of the molecule–substrate bond Cai Shen1,2 and Manfred Buck*1
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City

Ningbo / Pesika / Oelhafen / Feldheim / /

Company

Kandel S. A. / Kautz N. A. / Amro N. A. / Sigma-Aldrich / Creative Commons / /

Country

Germany / United Kingdom / /

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Event

Product Issues / /

Facility

Institute of Materials Technology / University of St Andrews / /

IndustryTerm

metal / ethanol solution / bulk metal / electrochemical printing / deposited metal / metal deposition / metal bond / e-beam / supramolecular networks / metal structures / metal clusters / metal atoms / basic solution / metal ions / aqueous solution / /

NaturalFeature

Au islands / /

Organization

Chinese Academy of Sciences / University of St Andrews / African Union / 1EaStCHEM School of Chemistry / Beilstein-Institut / European Union / EU / 2Ningbo Institute of Materials Technology & Engineering / /

Person

T. Glatzel / Manfred Buck / Georg Albert / Shen / T. Schimmel Keywords / /

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Position

Corresponding author / /

Product

SAM / /

ProvinceOrState

Nova Scotia / /

PublishedMedium

the Beilstein Journal / /

Technology

semiconductors / lithography / pdf / electrochemical cell / /

URL

http /

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