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Boron nitride / Boron / Fluorescence / X-ray fluorescence / Chemistry / Matter / Spectroscopy


Characterization of buried thin films with resonant soft x-ray fluorescence J. A. Carlisle, L. J. Terminello, and E. A. Hudson Lawrence Livermore National Laboratory, Livermore, California[removed]R. C. C. Perera and J. H.
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Document Date: 2001-02-02 16:02:00


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City

Livermore / New York / San Jose / /

Company

RBS / IBM / Lawrence Livermore National Laboratory / Ridge National Laboratory / Ge / J. H. Underwood Lawrence Berkeley Laboratory / /

Currency

USD / /

Facility

University of Tennessee / American Institute / D. L. Ederer Tulane University / J. J. Jia University of Tennessee / E. A. Hudson Lawrence Livermore National Laboratory / Almaden Research Center / American Institute of Physics / /

IndustryTerm

incident photon energy / buried thin film systems / resonant energy / thin film systems / excitation energy / resonant excitation energy regime / nonresonant energy regime / resonance energy / near-resonant excitation energy / energy / obtained using a near-resonant excitation energy / /

OperatingSystem

DOS / Fermi / /

Organization

Science Alliance Center for Excellence Grant / Division of Materials Science / American Institute of Physics / F. J. Himpsel IBM Research Division / U.S. Department of Energy / M. G. Samant IBM Research Division / National Science Foundation / Tulane University / New Orleans / Thomas J. Watson Research Center / J. A. Carlisle / L. J. Terminello / and E. A. Hudson Lawrence Livermore National Laboratory / University of Tennessee / Knoxville / University of Tennessee / Almaden Research Center / office of Basic Energy Sciences / /

Person

Thomas J. Watson / C. A. Taylor / II / /

Position

Walker / Phys / /

Product

B 47 / /

ProvinceOrState

Tennessee / Louisiana / New York / California / /

Technology

radiation / x-ray / spectroscopy / html / /

URL

http /

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