![](https://www.pdfsearch.io/img/a5844e92f97017ac91660c6f9a9ba8e7.jpg) Date: 2012-06-07 11:55:05
| | 25nm Immersion Lithography at a 193nm Wavelength Bruce W. Smith, Yongfa Fan, Michael Slocum, Lena Zavyalova Rochester Institute of Technology, Microelectronic Engineering Department, 82 Lomb Memorial Drive, Rochester, NeAdd to Reading ListSource URL: www.rit.eduDownload Document from Source Website File Size: 3,25 MBShare Document on Facebook
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