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Band gap / Gallium nitride / Carrier generation and recombination / Indium phosphide / Indium gallium nitride / Zinc oxide / Burstein–Moss effect / Semiconductor / Carrier scattering / Chemistry / Nitrides / Indium nitride


1 JULY[removed]VO L U M E 106 N U M B E R 1
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Document Date: 2009-07-15 13:06:17


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IIInitride / F4 / P63mc / National Laboratory / Fm3m / /

Country

United States / /

Currency

pence / USD / /

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Facility

For InN / NARROW BANDGAP OF InN / AlN GaN InN / A. InN / American Institute / American Institute of Physics / University of California / B. InN / /

IndustryTerm

power law fits / acceptor binding energy / photon energy / orbital energy / energy gap / energy range / low energy side / interaction energy / chemical trends / electronic and optoelectronic devices / monotonic chemical trend / energy difference / metal-organic chemical vapor deposition / power law dependence / free carrier absorption / energy / power law index / energy position / peak energy / free carrier concentrations / carrier dynamics / related / energy gaps / carrier scattering / higher energy / laser technologies / power law / state lighting technology / activation energy / space / /

MusicGroup

III / InN / /

OperatingSystem

Fermi / /

Organization

American Institute of Physics / Department of Materials Science and Engineering / University of California / Berkeley / U.S. Securities and Exchange Commission / International Commission on Illumination / Division of Materials Sciences / /

Person

Lawrence Berkeley / Also / /

Position

Prime Minister / as55 Author / Author / /

Product

M-16 / /

ProvinceOrState

California / /

Technology

semiconductor / Radiation / aV / laser technologies / chemical vapor deposition / semiconductors / state lighting technology / dielectric / optoelectronics / spectroscopy / recombination / /

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http /

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