The measurement of sticking probability of some matal atoms on Si surface in pulsed arc plasma

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Date: 2014-12-11 20:16:57 Science Astrophysics Plasma Cathodic arc deposition Sputter deposition Ion Electric current Thin film Madison Symmetric Torus Chemistry Physics Thin film deposition		The measurement of sticking probability of some matal atoms on Si surface in pulsed arc plasma Add to Reading List Source URL: eetd.lbl.gov Download Document from Source Website File Size: 1,17 MB Share Document on Facebook

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