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Ion implantation / Zinc oxide / Annealing / Center of Excellence in Nanotechnology at AIT / Chemistry / Semiconductor device fabrication / Materials science
Date: 2007-11-11 12:22:08
Ion implantation
Zinc oxide
Annealing
Center of Excellence in Nanotechnology at AIT
Chemistry
Semiconductor device fabrication
Materials science

phys. stat. sol. (c) 4, No. 10, 3646– DOIpsscIon species dependence of the implantation-induced defects in ZnO studied by a slow positron beam Z. Q. Chen∗1 , M. Maekawa2 , A. Kawasu

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