Matsuda / Partner State Key Laboratory / Thin Solid Films / I. I NTRODUCTION Z INC / Corning / Optoelectronics Technologies / /
Country
United States / China / / /
Event
Product Issues / /
Facility
Partner State Key Laboratory / Hong Kong University of Science / Stanford University / Soochow University / Massachusetts Institute of Technology / /
IndustryTerm
lower formation energy / thermal processing / metal oxide materials / metal oxides / micro-fabrication technology / lower processing temperature / organic lightemitting diode display technology / plasma-enhanced chemical vapor deposition / amorphous oxide semiconductor thin-film transistor devices / /
Organization
Hong Kong University of Science and Technology / Hong Kong / Center for Integrated Systems / Stanford University / Soochow University / Massachusetts Institute of Technology / Department of Electronic and Computer Engineering / /
Person
C. S. Xue / M. Liu / G. Van de Walle / C. Yang / H. Z. Zhuang / M. Wong / J. D. Ye / V / Lei Lu / Z. Ye / J. Huang / S. C. Lai / B. Y. Man / X. Q. Wei / /
Position
Editor / transparent conductor / conductor / /
Product
N2 ambience / /
ProvinceOrState
Jiangsu / Florida / Massachusetts / Ontario / /
PublishedMedium
Condensed Matter / /
SportsLeague
Stanford University / /
Technology
semiconductor / dielectric / micro-fabrication technology / organic lightemitting diode display technology / radio frequency / Digital Object Identifier / technology of thin-film transistor / chemical vapor deposition / /
IEEE TRANSACTIONS ON ELECTRON DEVICES, VOL. 61, NO. 4, APRIL[removed]The Resistivity of Zinc Oxide Under Different Annealing Configurations and Its Impact on