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Photomask / Semiconductor fabrication plant / Extreme ultraviolet / Nanotechnology / Ultraviolet / University at Albany / SUNY / Technology / New York / Electromagnetism / Extreme ultraviolet lithography / College of Nanoscale Science and Engineering / SEMATECH


Sematech Advances EUV Technology by Reducing Defects in Mask Blanks
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Document Date: 2015-03-04 02:48:20

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File Size: 26,02 KB

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City

New York / /

Company

Albany NanoTech / Beam Process Equipment Group / Asahi Glass / Veeco Instruments Inc. / Sematech Advances EUV Technology / /

Event

Company Expansion / /

Facility

College of Nanoscale Science / Albany-State University of New York / /

IndustryTerm

metrology tools / computer chips / semiconductor chips / /

Organization

Mask Blank Development Center / SEMATECH North's Mask Blank Development Center / College of Nanoscale Science and Engineering / State University of New York / /

Person

Joseph Bruno / Robert Oates / Giang Dao / David Krick / Sheldon Silver / Alain Kaloyeros / George Pataki / /

Position

Governor / program manager / President / lithography director / vice president and general manager / Majority Leader / Vice President and Chief Administrative Officer / Assembly Speaker / /

ProvinceOrState

North Dakota / /

Technology

semiconductor / EUVL technology / laser / computer chips / EUVLproduced semiconductor chips / lithography / /

URL

www.tcpdf.org / http /

SocialTag