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Date: 2015-04-13 10:58:59 Extreme ultraviolet lithography Extreme ultraviolet Microtechnology Immersion lithography Computational lithography Interference lithography Photoresist Photomask College of Nanoscale Science and Engineering Materials science Electromagnetic radiation Technology		Add to Reading List Source URL: spie.org Download Document from Source Website File Size: 1,18 MB Share Document on Facebook

	Wave and particle in molecular interference lithography Thomas Juffmann,1 Stefan Truppe,1 Philipp Geyer,1 Andr´as G. Major,1, ∗ Sarayut Deachapunya,1, 2 Hendrik Ulbricht,1, 3 and Markus Arndt1 arXiv:1001.0468v1 [quant DocID: 1dt47 - View Document
	FRAUNHOFER INSTI TUTE FOR I NTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB General Description Dr.LiTHO is a comprehensive simulation environment for photolithography developed at Fraunhofer IISB. Its main focus is on de DocID: 19pQs - View Document
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$Electromagnetic radiation / Photonics / Diffraction grating / Extreme ultraviolet / Grating / Interference lithography / Electron beam lithography / Extreme ultraviolet lithography / Long-period fiber grating / Optics / Diffraction / Optical devices$	Nanostructuring News August 2010 25nm half-pitch EUV fabricated gratings now available Eulitha continues to add higher resolution structures to its line of standard DocID: Pml2 - View Document
	SLS Symposium on Nanostructures and Nanoparticles Tuesday, May 13, [removed]:00 to 11:45, WBGB[removed]:00 Surface sensitive measurements on the nanometer scale by means of grazing emission X-ray fluorescence DocID: ODX4 - View Document