Back to Results
First PageMeta Content
Materials science / Condensed matter physics / Semiconductor device fabrication / Nuclear physics / Surface chemistry / Ion implantation / Collision cascade / X-ray photoelectron spectroscopy / Stopping and Range of Ions in Matter / Physics / Chemistry / Science


APPLIED PHYSICS LETTERS VOLUME 85, NUMBER[removed]OCTOBER 2004
Add to Reading List

Document Date: 2010-08-04 14:09:50

Open Document

File Size: 128,40 KB

Share Result on Facebook

City

Kyoto / Piscataway / Salford / London / New York / Oxford / /

Company

CCLRC Daresbury Laboratory / RBS / M. Werner Joule Physics Laboratory / Applied Materials / /

Country

United Kingdom / /

Currency

USD / /

/

Facility

American Institute of Physics Downloaded / T. C. Q. Noakes CCLRC Daresbury Laboratory / University of Salford / Foundry Lane / American Institute of Physics / Institute of Materials Research / /

IndustryTerm

higher energy ions / energy scale / then energy spike conditions / low energy / energy range / higher energy ions similar agreement / high-depth-resolution medium-energy-ion scattering / low energy ions / energy increases / latter neglects inelastic energy losses / energy spectra / ion energy / energy / been determined using high-depth-resolution medium-energy-ion scattering / /

Movie

D. V / /

Organization

American Institute of Physics Downloaded / American Institute of Physics / University of Salford / Institute of Materials Research / T. C. Q. Noakes CCLRC Daresbury Laboratory / /

Person

Ion Implant / /

Position

RT / /

ProvinceOrState

New Jersey / New York / /

Technology

recombination / /

URL

http /

SocialTag