SUPPLEMENTARY INFORMATION doi:nature14417 SUPPLEMENTARY METHODS MOCVD growth of ML MoS2 and WS2 films. As illustrated in Fig. 2a, the synthesis of ML

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Date: 2015-05-17 22:51:54 Chemistry Matter Thin film deposition Semiconductor device fabrication Metalorganic vapour phase epitaxy Atomic layer deposition Nucleation Indium nitride Grain boundary Molybdenum disulfide		SUPPLEMENTARY INFORMATION doi:nature14417 SUPPLEMENTARY METHODS MOCVD growth of ML MoS2 and WS2 films. As illustrated in Fig. 2a, the synthesis of ML Add to Reading List Source URL: park.chem.cornell.edu Download Document from Source Website File Size: 1,68 MB Share Document on Facebook

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	SUPPLEMENTARY INFORMATION doi:nature14417 SUPPLEMENTARY METHODS MOCVD growth of ML MoS2 and WS2 films. As illustrated in Fig. 2a, the synthesis of ML DocID: 1qxxx - View Document
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