![Semiconductor device fabrication / Tungsten compounds / Nonmetals / Coatings / Oxide / Etching / Tungsten / Sputtering / Sputter deposition / Chemistry / Matter / Chemical elements Semiconductor device fabrication / Tungsten compounds / Nonmetals / Coatings / Oxide / Etching / Tungsten / Sputtering / Sputter deposition / Chemistry / Matter / Chemical elements](https://www.pdfsearch.io/img/be1672f9b35b33e36080b69517f09add.jpg)
| Document Date: 2012-07-16 15:39:30 Open Document File Size: 336,74 KBShare Result on Facebook
City Bovec / Ljubljana / / Company Physical Electronics Ind. / The AES / / Continent Europe / / Country Germany / Slovenia / / / Facility Jozef Stefan Institute / / IndustryTerm polished stainless steel substrates / set-up device / gas flow / chemical erosion / stainless steel / stainless steel substrate / chemical composition / deposition device / flat metal oxides / oil rotary pump / chemical methods / suitable metal / energy / / MarketIndex case 20 / case 50 / / Organization Jozef Stefan Institute / / Person Marianne Balat / J.A. Ferreira / V / A. Litnovsky / V / Rok Zaplotnik Induktio / Peter Panjan / Aleksander Drenik Jožef / / Position volume flow controller / / Product Olympus FE-20 Digital Camera / / ProvinceOrState Pennsylvania / / Technology laser / X-ray / spectroscopy / Microwave / recombination / flash / /
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