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Computational lithography / Extreme ultraviolet lithography / Multiple patterning / Photolithography / Immersion lithography / Optical proximity correction / Lithography / Resist / Electron beam lithography / Materials science / Technology / Microtechnology


Datasheet Sentaurus Lithography Predictive Modeling of Lithographic Processes Overview
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Document Date: 2014-11-07 14:34:17

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File Size: 837,94 KB

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Company

Synopsys Inc. / /

Country

United States / /

Facility

Sentaurus complex / /

IndustryTerm

buried metal line / actual device / viewer tool / technology nodes / technology options / technology step / line edge roughness technology options / semiconductor device / shared-memory hardware / manufacturing applications / Technology simulation / projection lens technologies / multi-core systems / layout tools / projection systems / parallel processing / e-beam / manufacturing / layout ideal verification tool / manufacturing process development / exposure tool / cockpit tool / /

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Position

lithography engineer / editor / integrated layout editor / local sales representative / /

Technology

semiconductor / broadband / Lithography / simulation / projection lens technologies / parallel processing / GUI / /

URL

www.synopsys.com / http /

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