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Semiconductor device fabrication / Thin film deposition / Materials science / Atomic layer deposition / Electrical resistivity and conductivity / Plasma / Coating / Titanium nitride / Polycrystalline silicon / Chemical vapor deposition


MATEC Web of Conferences 39 , ) DOI: m atecconf1 0  C Owned by the authors, published by EDP Sciences, 2016 Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the
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