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Surface chemistry / Science / Condensed matter physics / Nanotechnology / Intermolecular forces / Hydrophobe / Self-assembled monolayer / Contact angle / Lithography / Chemistry / Physical chemistry / Fluid mechanics


COMPUTATIONAL MODELING OF DIRECT PRINT MICROLITHOGRAPHY
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Document Date: 2009-09-16 18:45:40


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City

San Diego / New York / Cambridge / /

Company

Eastman Kodak Corporation / /

Facility

Susquehanna University / Princeton University / S. WAGNER+ *Interfacial Science Laboratory / /

IndustryTerm

micro-contact printing / electronic devices / laboratory printing press / surface energy / screen printing / printing techniques / printing plate / inkjet-printing / printing / wet chemical etching / printing plates / chemical surface properties / wet printing techniques / paint films / non-imaging areas / printing process / chemical bond / suitable solution / /

Organization

Princeton University / Defense Advanced Research Projects Agency / S. WAGNER+ *Interfacial Science Laboratory / Susquehanna University / /

Person

D. L. Allara / A. Dodabalapur / V / J. H. Georger / V / /

ProvinceOrState

New Jersey / /

Technology

semiconductor / lithography / simulation / photolithography / /

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