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Dry etching
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1	acs_NL_nl-2011-02708d 1..5 Add to Reading List Source URL: rogers.matse.illinois.edu Language: English - Date: 2011-12-15 14:23:18 Chemistry Semiconductor device fabrication Microtechnology Materials science Technology Etching Nanowire Dry etching Gallium arsenide Wafer Chemical milling Photolithography
2	Etching mechanism of the single-step through-silicon-via dry etch using SF6/C4F8 chemistry Zihao Ouyang, D. N. Ruzic, Mark Kiehlbauch, Alex Schrinsky, and Kevin Torek Citation: Journal of Vacuum Science & Technology A 32 Add to Reading List Source URL: cpmi.illinois.edu Language: English - Date: 2015-04-22 08:46:33
3	Wet and Dry Etching Avinash P. Nayak, Logeeswaran VJ¥ and M. Saif Islamǂ University of California, Davis. California. ¥ ǂ Add to Reading List Source URL: web.ece.ucdavis.edu Language: English - Date: 2011-06-06 16:54:53
4	Dry EtchOct2011.qxp:44 AM Add to Reading List Source URL: www.mksinst.com Language: English - Date: 2011-10-14 10:04:12 Technology Etching Reactive-ion etching Isotropy Microelectromechanical systems Dry etching Semiconductor device fabrication Microtechnology Materials science
5	Dry Etch and Plasma System 1. Scope 1.1 This document provides operating procedures and requirements to etch silicon or silica with gas plasma system. Add to Reading List Source URL: www.chemistry.hku.hk Language: English - Date: 2015-05-06 04:34:43 Visual arts Microtechnology Technology Plasma processing Plasma Isotropic etching Industrial etching Silicon dioxide Glass etching Semiconductor device fabrication Etching Materials science
6	NANOELECTRONICS FABRICATION FACILITY (NFF), HKUST Standard Operating Manual ___________________________________________________________ Oxford Plasmalab 80 Plus Plasma Etcher Add to Reading List Source URL: mfz140.ust.hk Language: English - Date: 2014-07-23 02:45:21 Microtechnology Technology Physics Reactive-ion etching Plasma etching Plasma etcher Dry etching Etching Deep reactive-ion etching Semiconductor device fabrication Materials science Plasma processing
7	IEEE ELECTRON DEVICE LETTERS, VOL. 35, NO. 5, MAY[removed]Nanometer-Scale Vertical-Sidewall Reactive Ion Etching of InGaAs for 3-D III-V MOSFETs Add to Reading List Source URL: www-mtl.mit.edu Language: English - Date: 2014-05-20 14:14:37 Technology Microtechnology Etching Microelectromechanical systems Reactive-ion etching Nanowire Indium gallium arsenide MOSFET Dry etching Semiconductor device fabrication Materials science Chemistry
8	SELF HELP FOR OSTOMATES ALWAYS REMEMBER: Prevention is better than cure and with that in mind the following information will be of benefit to ostomates. It is essential that skin must be kept intact, clean and dry; for C Add to Reading List Source URL: www.australianstoma.com.au Language: English - Date: 2011-11-04 07:27:13 Gastroenterology Surgery Colostomy Stoma Wound Wafer Etching Ostomy pouching system Ileostomy Medicine Semiconductor device fabrication Digestive system surgery
9	MUEGGE_Poster_MEMS-Stripping-Technology-Tool_Rev00 Add to Reading List Source URL: www.muegge.de Language: English - Date: 2015-01-07 04:55:26 Technology Physics Plasma processing Etching Plasma etching Microelectromechanical systems Dry etching Plasma Microwave Semiconductor device fabrication Materials science Microtechnology
10	A FULLY DRY SELF-ASSEMBLY PROCESS WITH PROPER IN-PLANE ORIENTATION Sangjun Park and Karl F. Bö Böhringer Department of Electrical Engineering University of Washington, Seattle, WA[removed] Add to Reading List Source URL: www.ee.washington.edu Language: English - Date: 2008-01-10 14:48:22 Technology Deep reactive-ion etching Etching Microfabrication Wafer Isotropic etching Passivation Microelectromechanical systems Semiconductor device fabrication Materials science Microtechnology

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