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A Place-and-Route Paradigm Shift: Detailed-Route-Centric Solution Now Required Each technology node adds tougher physical design challenges and more stringent design rules. Modern lithography requires dual patterning and
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Document Date: 2018-10-02 12:52:32
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File Size: 386,37 KB
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A Place-and-Route Paradigm Shift: Detailed-Route-Centric Solution Now Required Each technology node adds tougher physical design challenges and more stringent design rules. Modern lithography requires dual patterning and