F R A U N H O F E R I N S T I T U T E F O R I N T E G R AT E D S Y S T E M S A N D D E V I C E T E C H N O L O G Y I I S B CRYSTALLINE MATERIALS FOR ELECTRONIC AND ENERGY SYSTEMS CONTACT

First Page		Document Content
Date: 2016-06-08 05:11:47 Chemistry Matter Semiconductor device fabrication Crystals Thin film deposition Inorganic compounds Semiconductor growth Epitaxial wafer Epitaxy Czochralski process Hydride vapour phase epitaxy Wafer		F R A U N H O F E R I N S T I T U T E F O R I N T E G R AT E D S Y S T E M S A N D D E V I C E T E C H N O L O G Y I I S B CRYSTALLINE MATERIALS FOR ELECTRONIC AND ENERGY SYSTEMS CONTACT Add to Reading List Source URL: www.iisb.fraunhofer.de Download Document from Source Website File Size: 4,73 MB Share Document on Facebook

	F R A U N H O F E R I N S T I T U T E F O R I N T E G R AT E D S Y S T E M S A N D D E V I C E T E C H N O L O G Y I I S B CRYSTALLINE MATERIALS FOR ELECTRONIC AND ENERGY SYSTEMS CONTACT DocID: 1qYk7 - View Document
	http://story.zimbabwestar.com/index.php/ct/9/cid/f825b92e19df63 DocID: 1qRHh - View Document
	Wurtzitic Boron Nitride on Diamond: The Ultimate Epitaxial Wafer for “Semiconductor on Insulator” James Chien-Min Sung Address: KINIK Company, 64, Chung-San Rd., Ying-Kuo, Taipei Hsien 239, Taiwan, R.O.C. Tel: 886-2- DocID: 1gwh4 - View Document
	ascatron ascatron ascatron ascatron ascatron ascatr Ascatron is specializing on the material, design and manufacturing of Silicon Carbide (SiC) semiconductor devices. With high quality epitaxial material technology Ascat DocID: nXHu - View Document