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Chemistry / Rutherford backscattering spectrometry / Elastic recoil detection / Particle-induced X-ray emission / Ion implantation / Nuclear reaction analysis / Thin film / Nuclear data / Ion beam analysis / Materials science / Physics / Science


IAEA-TECDOC[removed]Ion beam techniques for the analysis of light elements in thin films, including depth profiling Final report of a co-ordinated research project
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Document Date: 2004-11-04 08:25:25


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File Size: 2,57 MB

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City

Vienna / /

Company

RBS / AES / /

Country

Austria / /

IndustryTerm

electronic devices / performance assessment tool / incident beam energy / high energy / electrical and chemical properties / gas-ionisation / plasma-enhanced chemical vapor deposition / film systems / functional devices / artificial neural networks / energy range / resonance energy / energy response function / /

Movie

Depth Profiling / For the first time / DEPTH PROFILING IAEA / VIENNA / /

Organization

International Atomic Energy Agency / Division of Physical and Chemical Sciences / /

Person

A. Markwitz / V / Guo Jiyu / A. Viera / V / /

Product

A-1400 Vienna / /

Technology

semiconductors / Markov Chain Monte Carlo algorithm / CVD / chemical vapor deposition / /

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