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Electronic engineering / Semiconductor device fabrication / Atomic physics / Electromagnetism / Photoemission spectroscopy / High-k dielectric / Titanium nitride / Spectroscopy / Core electron / Physics / Chemistry / Emission spectroscopy


Photon Factory Activity Report 2010 #28 Part BSurface and Interface 2C/2008S2-003 Effect of nitrogen bonding states on dipole at the HfSiO/SiON interface studied by
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Document Date: 2012-01-30 04:32:45


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City

Tokyo / /

Country

Japan / /

Currency

pence / /

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Facility

The University of Tokyo / Photon Factory / /

IndustryTerm

higher binding energy / energy positions / transition metal oxide materials / photon energy / energy resolutions / nitrogen gas pressure / energy / /

Organization

University of Tokyo / Tokyo / High Energy Accelerator Research Organization / Research Organization / Department of Applied Chemistry / /

Technology

semiconductor / spectroscopy / Radiation / dielectric / /

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