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Electronics / Transistor / Bipolar junction transistor / Integrated circuit / Solar cell / Substrate / Silicon / CMOS / Field-effect transistor / Technology / Semiconductor devices / Electronic engineering


The Origins of Diffused-Silicon Technology at Bell Labs, [removed]* by Nick Holonyak, Jr.
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Document Date: 2012-04-20 11:03:50


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File Size: 1,10 MB

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City

Princeton / Kyoto / New York / /

Company

Shockley Semiconductor Laboratory / Bell Telephone Laboratories / AT&T / Bell Labs. / Power Electronics / /

Country

Japan / /

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Facility

College Park / University of Illinois / American Institute of Physics / /

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Holiday

Christmas / /

IndustryTerm

semiconductor technology / thin-layer technology / dry-gas impurity diffusion / diffused-impurity devices / diffusedsilicon device technology / energy gap / integrated circuit technology / electrical device / diffused-impurity silicon switching devices / peculiar new technology / aluminum-metallization technology / diffused-silicon devices / metal / diffusedbase alloyed-emitter silicon p-np device / minority-carrier lifetimes / dry-gas / electronics industry / device processing / silicon technology / silicon devices / metal contacts / device technology / double-diffused n-p-n device / diffused silicon technology / diffused-base silicon transistor technology / metal evaporation / dry-gas diffusion procedures / transistor technology / process technology / low-leakage switching devices / exploratory silicon device / energy band gap / silicon switching devices / metallization technology / diffusedsilicon devices / dry gas / historic technology / prototype devices / gas-tube cross-point switch / /

NaturalFeature

West Coast / /

Organization

American Institute of Physics / Courtesy AT&T Archives and History Center / University of Illinois / Device Development Department / Electrochemical Society / History Center / /

Person

James M. Goldey / Link Derick / Calvin Fuller / G. Kaminsky / John L. Moll / F. J. Biondi / Morris Tanenbaum / Prince / M. Tanenbaum / William Shockley / N. Holonyak / Jr. / Lincoln Derick / Crystal Fire / R. M. LeLacheur / Nick Holonyak / Jr. / George Bemski / D. Van Nostrand / Proceedings Vol / Jack Morton / Metrology / D. E. Thomas / John Bardeen / Carl Frosch / Characterization / /

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Position

Author / Professor of Electrical / chemist / Editor / collector / technician / transistordevelopment head / Prince / /

ProgrammingLanguage

J / /

ProvinceOrState

New York / New Jersey / Illinois / /

PublishedMedium

Physics Today / /

Region

West Coast / /

Technology

third Transistor Technology / diffused silicon technology / diffusedsilicon device technology / process technology / photolithography / diffused-base silicon transistor technology / thin-layer technology / semiconductor / semiconductor technology / aluminum-metallization technology / metallization technology / integrated circuit technology / historic technology / transistor technology / laser / Silicon Technology / device technology / integrated circuit / /

URL

www.electrochem.org / /

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