S. Fakra S. A. / Silson Ltd. / Sigma Aldrich / ITRANS / Kearsley L. P. / K. Messenger S. A. / R. Ryan S. A. / C. Jacobsen L. P. / /
Country
Switzerland / Germany / United States / /
Currency
Peso / USD / /
Facility
American Institute / North Carolina State University / American Institute of Physics / /
IndustryTerm
chemical sensitivity / photon energy / photon energy regime / excitation energy / low energy electrons / low energy secondary electrons / kinetic energy determination / e-yield / chemical properties / toluene solution / chemical state / photon-energy dependant absorption coefficients / gas-phase spectra / energy regime / energy filter / /
Organization
Division of Materials Science and Engineering / American Institute of Physics / U.S. Department of Energy / Universität Erlangen-Nürnberg / Department of Physics / office of Science / Graduate School / North Carolina State University / Raleigh / Paul Scherrer Institut / /
Person
K. Ziegler / S. L. Christensen / M. Guigner / T. Tyliszczak / H. Yabuta / T. Zega / S. Wirick / R. N. Zare / N. Posth / F. Bussolotti / V / S. G. Urquhart / E. D. Young / S. Messenger / L. Zimmerman / M. Zolensky / Paul Scherrer / M. Obst / M. E. Zolensky / C. Karunakaran / G. E. Brown / Jr. / H. Jabuta / D. Bertwistle / A. J. Westphal / M. Galvez / A. Meibom / V / T. Mikouchi / E. Zinner / Ben Watts / George Tzvetkov / F. Guyot / B. Wopenka / /
REVIEW OF SCIENTIFIC INSTRUMENTS 81, 033704 共2010兲 Surface sensitivity in scanning transmission x-ray microspectroscopy using secondary electron detection C. Hub,1 S. Wenzel,1 J. Raabe,2 H. Ade,3 and R. H. Fink1 1