![Thin film deposition / Semiconductor device fabrication / Atomic layer deposition / Matter / Manufacturing / Chemistry / Thin film / ALD / Vacuum deposition Thin film deposition / Semiconductor device fabrication / Atomic layer deposition / Matter / Manufacturing / Chemistry / Thin film / ALD / Vacuum deposition](https://www.pdfsearch.io/img/f9b27726b69e033c984a68f61f5dde54.jpg) Date: 2009-11-24 11:31:03Thin film deposition Semiconductor device fabrication Atomic layer deposition Matter Manufacturing Chemistry Thin film ALD Vacuum deposition | | Journal of Undergraduate Research 3, Atomic Layer Deposited Al2 O3 Film on Si(100) as Buffer Layer for Hfx Ti1−x O2 Deposition Adam L. Kueltzo Thornton Fractional North High School, Calumet City, IL 60409Add to Reading ListSource URL: jur.phy.uic.eduDownload Document from Source Website File Size: 651,66 KBShare Document on Facebook
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