Kobe / San Francisco / Francisco / Osaka / Washington DC / Brisbane / Baltimore / Cancun / Tokyo / Kyoto / Las Vegas / Honolulu / Sendai / Nagoya / San Diego / Arlington / /
Company
Ge Metal / Electron-Mobility Ge n-Channel Metal / LaYOx Films / Kubota / GeO 2 Films / Si/HfO2 MOS Systems / Dielectric Films / Amorphous Indium Zinc Oxide Thin Films / Advanced Complementary Metal / Junctionless Ge p-Channel Metal / Silicon Thin Films / on Semiconductor / NiO Bilayer Films / Pentacene Thin Films / HfLaOx Films / Silicon Films / HfO2 Thin Films / Multi-Layer Graphene Films / Grounded Gate Metal / Shimizu / Thin Solid Films / La2O3 Films / /
Facility
Hall Factor Measurement / /
IndustryTerm
low-pressure gas ambient / metal/germanium interface / metal-induced gap states / /
MusicGroup
Solar / Energy / Solution / /
OperatingSystem
Fermi / /
Organization
Electrochemical Society / /
Person
Naruto Miyakawa / Martin J. Gajek / Kosuke Nagashio / Akira Toriumi / Toshiyuki Tabata / Koji Kita / David W. Abraham / Choong Hyun Lee / Shinji Hibino / D. C. Worledge / Yugo Chikata / Tomonori Nishimura / / /
主要な発表論文 及び 国際会議での講演リスト List of Publications and Presentations at Major Conferences (1) W. F. Zhang, T. Nishimula, K. Nagashio, K. Kita, and A. Toriumi, "Conduction Band Offset at G