GaN HEMT / Compound Semiconductors / Cree Inc. / JEDEC Solid Technology / John Palmour Cree Inc. / /
Country
United States / / / /
IndustryTerm
process technologies / metal / volume manufacturing / metalorganic chemical vapor deposition / source metal / transistor technology / mm wafer process technology / explosive device / process technology / industrial applications / gold interconnect metal / large periphery device / source metal intermixing / defense applications / activation energy / /
Organization
JEDEC Solid Technology Association / /
Person
Scott Sheppard / Tina McNulty / Donald A. Gajewski / Jeff B. Barner / Jim Milligan / / /
Product
CGH40010 / GaN HEMT MMIC / /
ProgrammingLanguage
DC / /
ProvinceOrState
North Carolina / /
Technology
100 mm wafer process technology / AlGaN HEMT MMIC process technology / V3 process technology / RF technologies / dielectric / Qualification The G28V3 process technology / process technologies / G28V3 process technology / transistor technology / process technology / MMIC process technology / chemical vapor deposition / /
RELIABILITY OF GaN/AlGaN HEMT MMIC TECHNOLOGY ON 100-mm 4H-SiC Donald A. Gajewski, Scott Sheppard, Tina McNulty, Jeff B. Barner, Jim Milligan and John Palmour Cree Inc., 4600 Silicon Dr., Durham, NC[removed]Don_Gajewski@Cr