manufacturing error / chemical vapor deposition / energy conservation / fabrication algorithm / selective chemical etching / active and passive devices / chemical alteration / be achieved using either fabrication algorithm / /
Organization
National Sciences and Engineering Research Council / Sajeev John Department of Physics / Federal Communications Commission / U.S. Securities and Exchange Commission / University of Toronto / /
Person
Timothy Y. M. Chan / Eli Yablonovitch / JOHN FIG / Nicolas Tétrault / /
PHYSICAL REVIEW E 73, 046610 共2006兲 Photonic band-gap formation by optical-phase-mask lithography Timothy Y. M. Chan, Ovidiu Toader, and Sajeev John Department of Physics, University of Toronto, 60 St. George Street