First Page | Document Content | |
---|---|---|
Coatings Semiconductor device fabrication Solar cells Sputter deposition Titanium dioxide Thin film Sputtering High Power Impulse Magnetron Sputtering Chemistry Materials science Thin film deposition | Pulsed bias effect on roughness of TiO2:Nb films deposited by grid assisted magnetron sputteringAdd to Reading ListSource URL: www.appliedadhesionscience.comDownload Document from Source WebsiteFile Size: 1,60 MBShare Document on Facebook |