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Materials science / Chemistry / Manufacturing / Thin films / Coatings / R-value / Electrical resistivity and conductivity / Sputter deposition / Epitaxy / Thin film deposition / Semiconductor device fabrication / Chemical engineering


In-situ resistivity measurements during growth of ultra-thin Cr0.7 Mo0.3 K. B. Gylfason a , A. S. Ingason b,c , J. S. Agustsson d,c , S. Olafsson c , K. Johnsen e , J. T. Gudmundsson d,c,∗ a Lyfjathroun
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Document Date: 2005-11-09 03:26:32

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File Size: 171,18 KB

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City

Reykjavik / /

Company

Philips / 4 Crystal GmbH / Thin Solid Films / C. Films / Corning / /

Country

Germany / Iceland / /

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Facility

University of Iceland / Department Institute / University of Iceland Research Fund / /

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IndustryTerm

process gas / similar processing / metal particles / modified power law / free energy / magnetic data systems / strain energy / metal films / process gas pressure / nanoscale electronics / chemical interaction / /

Organization

University of Iceland / Reykjavik / Icelandic Research Council / Research Fund / Department Institute / Iceland Research Fund / /

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Position

conductor / Corresponding author / /

ProgrammingLanguage

Joule / /

ProvinceOrState

Missouri / /

Technology

Biopharmaceuticals / biosensors / x-ray / /

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