Cymer / Yezheng Tao Cymer Inc. / Lawrence Berkeley National Laboratory / /
Continent
Europe / /
Country
Taiwan / Japan / United States / Korea / /
Facility
University of Illinois / Thornmint Court / University of California / /
IndustryTerm
technology development / energy density / source technology / pre-pulse technology / scanner manufacturer / energy / lithography tools / debris mitigation technology / technology program / dimension imaging / High-energy ions / hydrogen buffer gas / optical imaging / high-volume manufacturing / duty cycle using pre-pulse technology / laser energy / /
Movie
A.I. / /
MusicGroup
CE / /
Organization
Fraunhofer Institut / University of California at San Diego / Thornmint Court / University of Illinois / SEMI / /
Person
Christian Laubis / Robert A. Bergstedt / Droplet Generator / Frank Scholze / Robert N. Jacques / Richard L. Sandstrom / Peter Baumgart / Alexander A. Schafgans / Jonathan Grava / Rod D. Simmons / Kevin Zhang / Urbana Champaign / Wayne J. Dunstan / Eric Gullikson / Silvia De Dea / Georgiy O. Vaschenko / Daniel J. Brown / Peter I. Porshnev / Robert J. Rafac / Hagen Pauer / David W. Myers / Mark Tillack / Christian Buchholz / Michael R. Woolston / Bob Lofgren / Farhad Salmassi / Christopher J. Wittak / David C. Brandt / Norbert R. Böwering / Vidusek / Alex I. Ershov / Marco Perske / Bruno M. La Fontaine / Golich / Vladimir Fleurov / Igor V. Fomenkov / John Sporre / Alexander N. Bykanov / David N. Ruzic / Michael J. Lercel / Laser Produced Plasma / /
Position
collector / D.J. / 5sr normal incidence collector / R.N. / controller / catcher / front runner / /
Product
LT1 / /
ProvinceOrState
Illinois / D.C / California / /
Technology
radiation / pre-pulse technology / lithography / duty cycle using pre-pulse technology / Process Control / integrated circuits / Alternative Lithographic Technologies / Laser System / Laser / MEMS / source technology / debris mitigation technology / /
Laser Produced Plasma EUV Sources for Device Development and HVM David C. Brandt*, Igor V. Fomenkov, Michael J. Lercel, Bruno M. La Fontaine, David W.