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Proposed list of topics for the workshop[removed]nm plasma sources to support high volume manufacturing (HVM) scanners Update on performance of high power EUV Sources Approaches to power scaling to enable 500 W - 1 kW E
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Document Date: 2013-08-14 22:44:49
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File Size: 238,53 KB
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Company
Metrology Sources (13.5 nm) Alternative EUV Source Technologies /
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IndustryTerm
technology readiness /
high volume manufacturing /
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Position
collector /
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ProgrammingLanguage
ML /
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Technology
radiation /
collector optics Technologies /
laser /
Lithography /
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URL
www.euvlitho.com /
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SocialTag
Extreme ultraviolet lithography
Extreme ultraviolet
Ultraviolet