| Document Date: 2006-10-31 04:02:22
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City San Francisco / / Company Polycrystalline Silicon Thin Films / Harry A. Atwater Thin Solid Films / BP / Corning Inc. / HWCVD Films / / Facility Harry A. Atwater Thomas J. Watson Laboratory of Applied Physics California Institute / California Institute of Technology / / IndustryTerm hot-wire chemical vapor deposition / minority carrier lifetimes / thin-film photovoltaic applications / photovoltaic devices / / Organization California Institute of Technology / Harry A. Atwater Thomas J. Watson Laboratory of Applied Physics California Institute of Technology Pasadena / / Person C.M. Garland / Christine E. Richardson / Raman Spectroscopy / M. S. Mason / Maribeth S. Mason / Harry A. Atwater / / ProvinceOrState California / / PublishedMedium Journal of Chemical Physics / Journal of Applied Physics / / Technology crystallization / spectroscopy / epitaxial silicon / simulation / CVD / Chemical Vapor Deposition / thermal desorption / /
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A Phase Diagram for Morphology and Properties of Low Temperature Deposited Polycrystalline Silicon Grown by Hot-wire Chemical Vapor Deposition Christine E. Richardson, Maribeth S. Mason, and Harry A. Atwater Thomas J. Wa