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Semiconductor device fabrication / Physics / Chemistry / Plasma processing / Manufacturing / Sputter deposition / Sputtering / Thin film / Hysteresis / Materials science / Thin film deposition / Coatings


Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides
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Document Date: 2012-06-28 02:10:16

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Company

Philips / Linköping University Electronic Press / J. A. Woollam Co. Inc. / Tektronix / Sweden 2 The Ångström Laboratory / Thin Solid Films / /

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Facility

Linköping University / Czech Technical University / Uppsala University / /

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IndustryTerm

metal / feedback control systems / reactive gas atoms / metal oxides / reactive gas flow / reactive gas mass flow / metal oxide systems / steel / energy / /

Organization

Department of Control Engineering / Czech Technical University in Prague / Faculty of Electrical Engineering / Plasma & Coatings Physics Division / Linköping University / Uppsala University / US Federal Reserve / /

Person

Montri Aiempanakit / Ulf Helmersson / Tomas Kubart / Petter Larsson / /

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Position

controller / Corresponding author / /

Product

Harman On Time Radio / /

ProvinceOrState

Pennsylvania / /

PublishedMedium

Control Engineering / /

Technology

X-ray / /

URL

http /

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