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Marshall Plan Scholarship 2011 Final Report High Power Impulse Magnetron Sputtering (HiPIMS) of Niobium Thin Films
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Document Date: 2012-08-18 23:26:36

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File Size: 2,09 MB

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City

Vienna / /

Company

Lawrence Berkeley National Laboratory / Diodes / Vf / /

Country

United States / /

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Facility

University of Southern California / University Innsbruck Technikerstrasse / University of California / /

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IndustryTerm

sputter coating technology / pulsed plasma processing techniques / thin metal wire filament / power technology / film technology / energy / /

MedicalCondition

MS / /

Organization

Final Report Albert Rauch Abstract / Final Report / Final Report Albert Rauch REVIEW OF SCIENTIFIC INSTRUMENTS / US Federal Reserve / University of Southern California / Los Angeles / University of California / Berkeley / Final Report Albert Rauch Typically / Institute for Thin Film Technology Leopold-Franzens-University Innsbruck Technikerstrasse / Austrian Marshall Plan Foundation / U.S. Securities and Exchange Commission / Final Report Albert Rauch Scholarship / Department of Electrical Engineering / /

Person

Albert Rauch / Jason M. Sanders / Albert Rauch Torkelweg / André Anders / Hans K. Pulker / /

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Position

VP / Advisor / Senior Physicist Leader / Plasma Applications Group / VP / the probe current / VP in Page / VP / the emitted thermal electrons / Marshall / Senior Physicist Leader / /

ProvinceOrState

Pennsylvania / Southern California / California / /

Region

Southern California / /

Technology

twisted pair / power technology / spectroscopy / sputter coating technology / Thin film technology / /

URL

http /

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