| Document Date: 2007-07-14 19:05:03
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City New Orleans / Cambridge / Marlboro / Pasadena / Bethlehem / / Company RBS / Elsevier Science B.V. / Evergreen Solar Inc. / Applied Materials / HFS / Thin Solid Films / National Renewable Energy Laboratory / / Country United States / / / Facility National Renewable Energy Laboratory / PtH complex / Lehigh University / California Institute of Technology / Pierce Hall / / IndustryTerm minority carrier lifetime / plasma chemical vapor deposition nitride layers / gas inlet / Solar cell processing / chemical vapor deposition / anti-reflection coating applications / transition metal impurity / gas delivery / photovoltaic applications / using plasma chemical vapor deposition nitride layers / / MarketIndex nm) / / Organization California Institute of Technology / Division of Engineering / Lehigh University / Department of Applied Physics / Department of Physics / / Person Harry A. Atwaterd / B. Schroeder / / / Position author / *Corresponding author / representative / / ProgrammingLanguage Cedar / / ProvinceOrState Pennsylvania / Louisiana / California / Massachusetts / / Technology radiation / spectroscopy / CVD / chemical vapor deposition / /
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Thin Solid Films[removed]–40 Hot-wire chemical vapor deposition of high hydrogen content silicon nitride for solar cell passivation and anti-reflection coating applications J.K. Holta,*, D.G. Goodwina, A.M. Gabor