Electron Beam Lithography Application: ■ Lithography for sub 10 nm resolution ■ Template fabrication for Nanoimprint Lithography ■ Lithography for high aspect ratio nanostructures ■ Highly accurate and flexible f - Hydrogen silsesquioxane - Document - PDFSEARCH.IO

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	Electron Beam Lithography Application: ■ Lithography for sub 10 nm resolution ■ Template fabrication for Nanoimprint Lithography ■ Lithography for high aspect ratio nanostructures ■ Highly accurate and flexible f Add to Reading List Document Date: 2014-06-05 08:16:18 Open Document File Size: 227,86 KB Share Result on Facebook Company AMO / / IndustryTerm biotechnology / / Technology Lithography / biotechnology / / SocialTag Optical materials Microtechnology Electron beam lithography Nanoimprint lithography Resist Photoresist Lift-off Hydrogen silsesquioxane Lithography Materials science

Electron Beam Lithography Application: ■ Lithography for sub 10 nm resolution ■ Template fabrication for Nanoimprint Lithography ■ Lithography for high aspect ratio nanostructures ■ Highly accurate and flexible fAdd to Reading List